Evaporation Materials TiO2 Granule, Optical Coating Use TiO2 99.9%

Evaporation Materials TiO2 Granule, Optical Coating Use TiO2 99.9%

• MF : TiO2
• MW: 79.87
• CAS: 1317-70-0

Name: titanium dioxide optical coating material

Molecular formula: TiO2

Specification: 1.0-4.0mm granular and flake

Refractive index: 2.35/500nm

Transmission range: 400-12000nm

Evaporation temperature: 2000-2200 ℃

Evaporation source: electron gun, tantalum boat, tungsten boat

Application: antireflection film, multilayer film

Titanium dioxide (chemical formula: TiO2), white solid or powdery amphoteric oxide, is the white pigment of *, commonly known as titanium dioxide. The adhesion of titanium dioxide is strong, not easy to chemical change, always white. Particularly valuable is that titanium dioxide is non-toxic. It has a high melting point, and is used to make refractory glass, glaze, enamel, pottery, high temperature resistant experimental vessels, etc.

Because of its high refractive index and relative firmness, people like to use this kind of high refractive index material in the visible and near-infrared region, but it is difficult to get a stable result. The simulation ratios of oxygen and titanium atoms of TiO 2, Ti 2O 3, TiO, Ti are 2.0, 1.67, 1.5, 1.0 respectively, It was found that the material with a ratio of 1.67 is relatively stable and generates a solid film with a repetition index of 2.21 at about 550nm. The first layer of the material with a ratio of 2 produces a refractive index of about 2.06, and the refractive index of the latter film is close to 2.21, Almost every TiO2 evaporation follows a principle: to achieve negligible absorption in the usable spectral region, which can reduce the limitation of oxygen pressure, temperature and evaporation speed. TiO2 needs IAD assisted plating, and the oxygen input port is under the baffle plate

The refractive index of TiO 2 has a great relationship with vacuum degree and evaporation rate. However, this problem can be solved by fully pre melting and IAD assisted plating. Therefore, in visible and near-infrared spectra, TiO2 is very popular

In IAD assisted deposition of TiO 2, 200 EV is needed for evaporation with shielded grid ion source, while 333ev or less is required for evaporation with unshielded grid ion source. The average energy is estimated to be about 60% of the driving voltage. If the ion energy exceeds the above value, TiO2 will absorb. However, SiO2 with electron gun evaporation can provide 600ev collision (ion radiation) energy without any adverse effect

The purpose of using 300ev driving voltage in the process of TiO2 / SiO2 is to use grid free ion source in both materials, so as to avoid changing the driving voltage of each layer. The choice of driving voltage depends on the range of TiO2, while the evaporation speed depends on the range of fully densification and no absorption film

TiO2 is used for antireflection film, light splitter film, cold light film, filter, high reflection film, spectacle film, thermal mirror, etc., black granular and white flake, melting point: 1175 ℃

Light transmission range (nm) refractive index (n) evaporation temperature (℃) evaporating source ﹣ application ﹣ impurity emission

500nm

400-12000 2.35-2000-2200 electron gun, antireflection film, more transparent

TiO2 is used in antireflection film, decorative film, filter and high reflection film

Application of Ti2O3 in antireflection filter