Evaporation Materials ZnO Granule, Optical Coating Use ZnO 99.9%

Evaporation Materials ZnO Granule, Optical Coating Use ZnO 99.9% 

M.W: 81.57

Density: 5.7 g / cm3

Melting point: 1975 ℃

Sublimation temperature: 1720 ℃

Physical properties: white powder or hexagonal crystal. It is odorless, tasteless and sand free. It turns yellow when heated and turns white again after cooling. It sublimates when heated to 1800 ℃. The covering power is half of that of titanium dioxide and zinc sulfide. The coloring power is twice that of basic lead carbonate. The average particle size of nano powder is more than 18 nm. The microscopic shapes of the particles are special column, short column, ball, short needle, star, feather, whisker and irregular.

ZnO has the advantages of high melting point, simple preparation, low deposition temperature and low electron induced defects. ZnO thin films grown on silicon substrate are expected to be compatible with traditional silicon planar process. In addition, aluminum doped ZnO films (Zao) have similar optical and electrical properties as ITO films, which can be used as transparent electrodes in the field of optoelectronic display.

The high resistivity and single c-axis preferred orientation of ZnO thin films determine that they have good piezoelectric constant and electromechanical coupling coefficient, and can be used as various piezoelectric, piezoelectric, electroacoustic and acousto-optic devices. ZnO thin films with moderate resistivity are n-type semiconductors. When combined with a suitable p-type semiconductor, they can be used as heterojunction in the field of solar photovoltaic conversion.

ZnO thin films can also be used to fabricate surface type gas sensors because of the variation of resistivity with the concentration of gas adsorbed on the surface. It can be used in reductive acid gas, combustible gas, CH group gas detector and alarm by mixing different elements. In addition, it has potential applications in blue light modulator, low loss rate optical waveguide, liquid crystal display, photocatalysis, electronic camera and thermal reflection window.

Application:

It is mainly used to prepare zinc salt, ZnO single crystal, gas sensitive, humidity sensitive, pressure sensitive, photosensitive materials and semiconductor electronic components. Electronic components and IC chip materials can be used as phosphor, photofluorescence, electric fluorescence, ultraviolet radiation, laser, X-ray, cathode ray fluorescence, lightning over-voltage protector, voltage regulator, frequency conversion element, invisible material, etc.

Packaging: polyethylene bottle package.

Zinc oxide film refers to the thin film composed of zinc oxide (ZnO). It has a hexagonal prismatic wurtzite lattice structure with an energy gap of 3.3ev at room temperature.

Preparation method:

It can be prepared by reactive vapor deposition, including reactive electron beam evaporation or reactive magnetron sputtering. Large area uniform ZnO films were prepared by chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition (PCVD) or Planar DC magnetron sputtering

Performance:

(1) ZnO transparent conductive film: in the visible light range of 100-800nm, the transmittance is more than 90%. In the process of preparing ZnO thin films, the resistance of each sheet can be controlled below 100 ohm and the transmittance is not changed. This kind of film can be widely used in liquid crystal display devices and solar cells, as well as windows for photodetectors and thermal mirrors for reflecting infrared rays.

(2) ZnO high resistance piezoelectric film: ZnO thick film (2-5um) prepared by Planar DC magnetron sputtering has good crystallinity, c-axis orientation and significant piezoelectric effect. It can be made into ZnO film pressure sensitive sensor.